D017220Chemicals & DrugsD25.339.291.300J01.637.051.339.291.300110.999667Dentin-Bonding AgentsFaculty Rankprns:fullNamefull nameprns:hasAuthorListauthor listprns:hasFacultyRankhas faculty rankprns:hasNetworkhas networkprns:hasPublicationVenuepublished inprns:informationResourceReferenceinformation resource referenceprns:isPrimaryPositionis primary positionprns:latitudelatitudeprns:longitudelongitudeprns:mainImagephotoprns:maxWeightmaximum weightprns:medlineTAjournal title abbreviationprns:meshDescriptorUIMeSH DescriptorUIprns:meshSemanticGroupNameMeSH semantic group nameprns:meshTreeNumberMeSH tree numberprns:minWeightminimum weightprns:numberOfAuthorsnumber of authorsprns:numberOfConnectionsnumber of connectionsprns:numberOfPublicationsnumber of publicationsprns:personIdPerson IDprns:personInPrimaryPositionperson in primary positionprns:positionInDepartmentposition in departmentprns:positionInDivisionposition in divisionprns:predicateNodepredicate nodeprns:publicationDatepublication dateprns:sortOrdersort orderprns:uniquenessWeightuniqueness weightprns:yearyearAcademic ArticleArticleDocumentbibo:pmidPubMed IdentifierDepartmentDivisionvivo:hrJobTitleHR job titleInformation ResourcePositionvivo:positionInOrganizationposition in organizationvivo:preferredTitlepreferred titlevivo:researchAreaOfresearch area ofvivo:subjectAreaForsubject area forrdf:predicatepredicaterdf:typetyperdfs:labellabelConceptAgentfoaf:firstNamefirst namefoaf:lastNamelast nameOrganizationPerson4ProfessorNeurological SciencesRush University, Rush Medical College0.06661810.06661811research area of0.2665610.2665611subject area forRobertWilsonRobert S. Wilson41.87328300000000-87.66936330000000349742Wilson, RobertProfessortrue1ProfessorProfessor15369689Schulze KA, Oliveira SA, Wilson RS, Gansky SA, Marshall GW, Marshall SJBiomaterialsEffect of hydration variability on hybrid layer properties of a self-etching versus an acid-etching system. Biomaterials. 2005 Mar; 26(9):1011-8.Biomaterials2005-03-01T00:00:002005Effect of hydration variability on hybrid layer properties of a self-etching versus an acid-etching system.